Cryogenic Deep Reactive Ion Etching of Silicon Micro and Nanostructures

نویسنده

  • Lauri Sainiemi
چکیده

OF DOCTORAL DISSERTATION HELSINKI UNIVERSITY OF TECHNOLOGY P.O. BOX 1000, FI-02015 TKK

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching.

We show that gallium-ion-implanted silicon serves as an etch mask for fabrication of high aspect ratio nanostructures by cryogenic plasma etching (deep reactive ion etching). The speed of focused ion beam (FIB) patterning is greatly enhanced by the fact that only a thin approx. 30 nm surface layer needs to be modified to create a mask for the etching step. Etch selectivity between gallium-doped...

متن کامل

Fabrication of micro/nano dual-scale structures by improved deep reactive ion etching

We present an integrated microand nanofabrication method to create micro/nano dual-scale silicon structures with a controllable sidewall profile over an entire 4 inch wafer. The fabrication is based on an improved Bosch deep reactive ion etching (DRIE) process and its black silicon effect, in which SF6 and C4F8 gases are used as the reactants of etching and passivation, respectively. The result...

متن کامل

Techniques of cryogenic reactive ion etching in silicon for fabrication of sensors

Cryogenic etching of silicon, using an inductively coupled plasma reactive ion etcher ICP-RIE , has extraordinary properties which can lead to unique structures difficult to achieve using other etching methods. In this work, the authors demonstrate the application of ICP-RIE techniques which capitalize on the cryogenic properties to create different sensors geometries: optical, electrical, magn...

متن کامل

Presented at the MRS Spring Meeting 2010 1 Micro-Channel Plate Detectors Based on Hydrogenated Amorphous Silicon

A new type of micro-channel plate detector based on hydrogenated amorphous silicon is proposed which overcomes the fabrication and performance issues of glass or bulk silicon ones. This new type of detectors consists in 80-100 μm thick layers of amorphous silicon which are micro-machined by deep reactive ion etching to form the channels. This paper focuses on the structure and fabrication proce...

متن کامل

Effect of Nano-Textured Silicon Substrate ‎on the Synthesize of Metal Oxides ‎Nanostructures

Metal oxides such as ZnO, SnO2 and W2O3 with super properties are widely used in the different fields of science and proper synthesis of these materials is of the great importance. In this work, some metal oxides with nano structures including SnO2 nanopyramids, V2O5 nanowires and hierarchical structure of SnO2 nan...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2009